Multiple Angle Laser Ellipsometer
Research-grade laser ellipsometer sets the standard for precise measurements, capturing film thickness, refractive index (n), and extinction coefficient (K) with unparalleled accuracy. Its versatility extends across a multitude of fields, including semiconductor research, integrated circuits, display technology, solar cells, optical thin films, life science, electrochemical studies, magnetic media storage, polymer, and metal surface treatment. From optical thin films to life science applications, and from electrochemical studies to magnetic media storage, its capabilities are limitless, making it an indispensable tool for researchers and innovators alike.
Our latest solar cell testing laser ellipsometer provides accurate measurements of reflection film thickness, refractivity (N), and extinction coefficient (K) parameters. Integrated with patented technologies and a versatile sample platform, it seamlessly handles both single crystal and polycrystalline solar cell samples, offering dual-functionality. Enhanced by new sample conditioning technology, it ensures precise positioning for accurate results. Additionally, its multi-threaded operation software enhances the user experience, making solar cell analysis seamless and efficient.
The applications of the laser ellipsometer span a wide range, making it versatile for various industries. It excels in measuring single and polycrystalline solar cells, including those with suede coatings and thin films, providing precise data on nano coating thickness, refractive index (n), and extinction coefficient (K). Its suitability for solar cell assembly lines is unmatched. Moreover, it finds utility in laboratory settings for researching nano thin film production technology and applications across semiconductor, microelectronics, integrated circuits, optical thin film, medical and life sciences, electrochemistry, flat panel displays, magnetic media storage, as well as polymer and metal processing.
| Wavelength of laser | 632.8nm (He-Ne laser) |
| Accuracy of coating thickness | 0.01nm (for SiO2coating on 110nm based on the Si) 0.05nm (for Si3N4 coating on 80nm based on textured Si substrate) |
| Accuracy of refractivity | 1x10-4 (for SiO2 coating on 110Nm based on the Si) 5x10-4 (for Si3N4 coating on 80nm based on textured Si substrate) |
| Optical structure | PSCA |
| Diameter of laser beam | < 1mm |
| Incident angle | 40 °-90 ° optional, step 5 ° |
| Size of sample table | Compatible with 125*125mm and 156*156mm single crystals and polycrystalline sample of cells |
| Single measurement time | 0.2s |
| Recommended measurement range | 0-6000nm |
| Maximum size (L×W×H) | 991×332×558mm (when the incident angle of 70 º) |
| Net weight | 25kg |
The EM01-RD multi angle laser ellipsometer is a versatile tool for nano coating research and development. It excels in accurately measuring nano coating thickness, refractive index (n), extinction coefficient (K), and more. Its applications extend to both smooth and textured nano thin films, solid lumps, and nano coatings with rapid changes, enabling real-time measurements. Equipped with patented technologies and customizable operation, it offers ease of use and flexibility, making it a valuable asset in research and development endeavors.
The applications of laser ellipsometer are extensive, offering fast, high-precision measurements of coating thickness, refractive index (n), and extinction coefficient (K) for nano-grade thin coating samples. Particularly suited for new scientific research and industrial products, it characterizes thin layers, multi-layer nanometer structures, and bulk materials (substrates) with exceptional accuracy. Its versatility extends across various fields of nano thin coating applications, including microelectronics, semiconductor research, integrated circuits, display technology, solar cells, optical coatings, life sciences, electrochemistry, magnetic media storage, polymer, and metal surface treatment.
| Wavelength of laser | 632.8nm (He-Ne laser) |
| Accuracy of coating thickness | 0.01nm (for SiO2coating on 110nm based on the Si) |
| Accuracy of refractivity | 1x10-4 (for SiO2coating on 110nm based on the Si) |
| Optical structure | PSCA |
| Diameter of laser beam | < 1mm |
| Incident angle | 40°-90° optional, step 5° |
| Size of sample table | Ø170mm |
| Single measurement time | 0.2s |
| Recommended measurement range | 0-6000nm |
| Maximum size (L×W×H) | 887×332×552mm (when the incident angle of 70 º) |
| Net weight | 25kg |
