Clean Non-Oxidizing High Temperature Chamber
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Clean non-oxidizing high temperature chambers can prevent products from oxidation under high temperature. It is ideal for application in semiconductor, liquid crystal, electronic products and precision appliance industries.
Reference Standards- GB/T2423.2-2008 Environmental Testing for Electric and Electronic Products - Part 2: Test B: High Temperature Test Method
- GJB150.3A-2009 Military Equipment Laboratory Environment Test Method Part 3: High Temperature Test
- IEC68-2-2 Test B: Dry heat
- GB/T 25915.1-2021 Cleanrooms and associated controlled environments Part 1: Classification of air cleanliness by particle concentration
Features
- High temperature resistant high efficiency filter, keeping the internal Cleanliness level of the high temperature chamber (in a class 10000 cleanroom) at grade 100 through vertical circulation.
- Circular arc in the chamber designed to prevent accumulation and settlement without dead angle.
- The inner chamber adopts jacket design, ensuring the cleanliness of the inner chamber during cooling.
- Using air to achieve rapid cooling, saving a lot of nitrogen compared with traditional models.
- Special temperature controller.
- Small temperature fluctuation and deviation.
- Manually adjusted nitrogen flow and display of the float flowmeter scale
- The solenoid valve controls the nitrogen flow to decrease when the temperature is stable (after oxygen content is reached).
- Automatic regulation of inert gas flow by electronic flowmeter software
- Online oxygen concentration analyzer
Model | | | | ||||
Effective Volume (L) | 91 | 216 | 512 | ||||
Temp. Range (℃) | Min | RT 30 | |||||
Max | 250 | 350 | 250 | 350 | 250 | 350 | |
Temp. Uniformity (℃) | ≤3.0 | ||||||
Temp. fluctuation (℃) | ≤ ±0.5 | ||||||
Temp. deviation (℃) | ±1.5 | ||||||
Cleanliness level | Class 100 (environment cleanliness level class 10000) | ||||||
Residual oxygen concentration in the chamber | 20 ppm minimum (depending on the purity of inert gas used) | ||||||
Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber≤100ppm | ≤30L/min (≤40min down to) | ≤60L/min (≤40min down to) | ≤120L/min (≤40min down to) | ||||
≤7L/min (concentration maintaining) | ≤14L/min (concentration maintaining) | ≤28L/min (concentration maintaining) | |||||
Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber50ppm | ≤30L/min (≤60min down to) | ≤60L/min (≤60min down to) | ≤120L/min (≤60min down to) | ||||
≤10L/min (concentration maintaining) | ≤20L/min (concentration maintaining) | ≤40L/min (concentration maintaining) | |||||
Cooling rate (℃/min) | 250℃ series, no load, from 225 ℃ to 60 ℃, ≤100min | ||||||
350℃ series, no load, from 350 ℃ to 60 ℃, ≤180min | |||||||
Heating rate (℃/min) | no load, from RT 15 ℃ to 200 ℃, ≤60min | ||||||
Internal Dimensions(mm) | w | 450 | 600 | 800 | |||
h | 450 | 600 | 800 | ||||
d | 450 | 600 | 800 | ||||
External dimensions(mm) | W | 950 | 1050 | 1100 | 1200 | 1300 | 1400 |
H | 1560 | 1660 | 1710 | 1810 | 1910 | 2010 | |
D | 1450 | 1550 | 1600 | 1700 | 1800 | 1900 | |
Maximum power (not the sum of all power) (KW) | 2.5 | 3.5 | 4.5 | 5.5 | 7.5 | 8.5 | |
Leakage switch 4P (A) | 10 | 10 | 10 | 16 | 16 | 16 | |
Noise (dB) | Less than 65 dB (measured 500 mm from the display screen) |
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