Power Supply (for Vacuum Coater)
To ensure a high sputtering rate and uniform deposition across a wide area of substrate, this mid-frequency power supply is the power of choice to enable a high deposition rate. If most of your vacuum coating work involves architectural glass or large-scale metal parts, the MF power supply is the ideal way to go.
Our DC power supply is the power source of choice for cathodic arc deposition process that uses one or two cathodes. If the substrate is conductive, a DC power can be applied to the substrate as well.
The cathodic arc power source is specially designed for use in arc vaporization, supplying the power needed to vaporize the cathode into a plasma state which is then deposited on the part substrate. The free ions reach the substrate surface at a high energy level, able to form a strong mechanical bond to the substrate.
Bias voltage power supply has received the widest use in recent years. It applies a bias voltage to the substrate, aiding the sputter cleaning, dry etching and film deposition process. The bias voltage power supply can be applied to various target materials in vacuum coating as well.
By supplying pulses of voltage to the target, the pulsed power supply can increase the ionization of the target material thereby ensuring an excellent deposit.
.jpg "Auxiliary Equipment <small>(for Vacuum Coating)</small>")
