Molybdenum Sputtering Target

Molybdenum Sputtering Target
Molybdenum Sputtering Target
Molybdenum Sputtering Target
Molybdenum Sputtering Target
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Using high quality molybdenum sputtering targets allows customers to get high definition quality images.

The purity of our molybdenum sputtering targets is ≥99.95%, and the formed film has a high electrical conductivity, minimizing particles formed during PVD. This series has an excellent density (planar target 10.15g/cm3, min., rotatable target 9.8g/cm3 Min)., and speed up production processes due to the high sputtering rate. The higher the density of the molybdenum, the higher the electrical conductivity of the formed coatings.

Molybdenum sputtering targets can be used in the production of electronic components and electronic products such as TFT-LCD (thin film transistor liquid crystal display/thin film semi-conductor tube-liquid crystal display), plasma displays, inorganic light emitting diode displays, field emission displays, thin film solar cells, sensors, semiconductor devices, and tunable work function CMOS (complementary metal oxide semiconductor) gate field effect transistors.

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Molybdenum Planar Target

We offer single chip and multi-chip planar targets for customers to choose from and provide bonding services. We can produce flat sputtering targets for all common systems according to specific customer needs.

Usage
TFT/STN/TN-LCD, PV Industry (CIGS)

Planar Target
Purity 99.95%Min
Density 10.15g/cm3 Min
Grain Size 100μm Max.
Specifications (Length x Width x Thickness) 2650*210*20mm
2300*200*16mm
2300*200*4mm
1950*200*16mm
1700*200*18mm
300 0 *248*22mm

Element Content: 99.95% of molybdenum Min.

Element W Si O Ni Na N K Fe Cu Cr C
1% ppm 300 25 50 50 20 20 30 50 15 20 50
Molybdenum Rotatable Target

By using our rotatable target, the target material utilization can be increased to 75%, and has a longer service life. For reusable steel or titanium liner tubes, rotatable targets produced by us can reach up to 2 meters.

Usage
PV industry (CIGS), TFT/STN/TN-LCD, semiconductor industry

Molybdenum Rotatable Target
Purity 99.95%Min
Density 9.8g/cm3 Min.
Grain Size 100μm Max.
Diameter 100-300mm
Length <2000mm

Element Content: 99.95% of molybdenum Min.

Element W Si O Ni Na N K Fe Cu Cr C
1% ppm 300 25 50 50 20 20 30 50 15 20 50
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